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Title Æ÷Ç×°ø´ë °¡¼Ó±â¿¬±¸¼Ò ¹Ú»çÈÄ ¿¬±¸¿ø (¹Ú»ç±Þ ¿¬±¸¿ø) ä¿ë °ø°í
Writer »ç¹«±¹ Date 2017-07-14
E-mail osk@osk.or.kr
Æ÷Ç×°ø´ë °¡¼Ó±â¿¬±¸¼Ò ¹Ú»çÈÄ ¿¬±¸¿ø (¹Ú»ç±Þ ¿¬±¸¿ø) ä¿ë °ø°í
 
Æ÷Ç×°ø´ë °¡¼Ó±â¿¬±¸¼Ò¿¡¼­´Â ¹ÝµµÃ¼ ºÐ¾ß (¹°¸®, ±â°è, ±¤ÇÐ, ¹ÝµµÃ¼ °øÇÐ ¹× Æ÷Åä·¹Áö½ºÆ®) ¿¬±¸ »ç¾÷¿¡ Âü¿©ÇÒ ¹Ú»çÈÄ¿¬±¸¿ø(Post-Doc)À» ä¿ëÇÏ°íÀÚ ÇÕ´Ï´Ù.
 
1. ºÐ¾ß ¹× Àοø (ÃÖ´ë 2ÀÎ)
  1). ¹ÝµµÃ¼¿ë Æ÷Å丮¼Ò±×·¡ÇÇ °ü·Ã ÆÐÅÍ´× ±â¼ú °³¹ß. (±ØÀڿܼ± ³ë±¤, EUV Lithography)
  2). X-ray interference lithography ±â¼ú °³¹ß
  3). Optics simulation, (ȸÀý ±¤ÇÐ°è ¼³°è, ½Ã¹Ä·¹À̼Ç)
  ** ¿¬±¸¿ø ¿ªÇÒ: »ï¼º¹Ì·¡±â¼úÀ°¼º»ç¾÷ (Â÷¼¼´ë ¹ÝµµÃ¼ Àç·á ¹× ¼ÒÀç) À» Àü´ãÇÒ ¹Ú»ç±Þ ¿¬±¸¿ø
                           ÇÁ·ÎÁ§Æ® ±â°£ (2017.9.1 ~ 2020.8.31)
  ** ¼¼ºÎºÐ¾ß: EUV Lithography °ü·Ã ¿¬±¸ ¹× ÇØ¿Ü °øµ¿ ¿¬±¸ ¼öÇà
2. ÀÚ°Ý¿ä°Ç: ±¹³».¿Ü ¹Ú»çÇÐÀ§ ÃëµæÀÚ (ÇØ´ç ºÐ¾ß ÇÁ·ÎÁ§Æ® ¼öÇà¿¡ ÀûÇÕÇÑ ºÐ)
3. °è¾à±â°£: 1³â ´ÜÀ§ °è¾à (ÃÖÀå 3³â + °¡´É)
4. ±Ù·ÎÁ¶°Ç: - ¿¬ºÀ°è¾àÁ÷(Post-Doc, ¹Ú»ç±Þ ¿¬±¸¿ø)
                - ¿¬ºÀ: °æ·Â ¹× ¸éÁ¢ °á°ú¿¡ µû¸¥ ÇùÀÇ
                - ±âŸ ±Ù·ÎÁ¶°ÇÀº Æ÷Ç×°ø°ú´ëÇб³ Á÷¿øº¹¹«±ÔÁ¤¿¡ µû¸§
5. ÀüÇü¹æ¹ý: - 1Â÷: ¼­·ùÀüÇü (¼­·ù Á¢¼ö ÈÄ 10ÀÏ À̳» Å뺸)
                 - 2Â÷: ¸éÁ¢ÀüÇü (¼­·ùÀüÇü ÇÕ°ÝÀÚ¿¡ ÇÑÇØ °³º° Å뺸ÇÔ, ¿¬±¸ ¹ßÇ¥ 30ºÐ)
6. Á¦Ãâ¼­·ù
             1). ÀÔ»çÁö¿ø¼­[´Ù¿î·Îµå]
             2). À̷¼­
             3). ¹Ú»çÇÐÀ§±â »çº»
             4). ÃÖ±Ù 5³â°£ ¿¬±¸½ÇÀû¹° ¸®½ºÆ® (³í¹® ¹× ¿¬±¸¾÷Àû, ÇÊ¿ä½Ã »çº» Á¦Ãâ)
             5). Ãßõ¼­ (¼±ÅûçÇ×)
7. ¼­·ùÁ¦Ãâ
             - Á¦Ãâ¹æ¹ý: ¿¬±¸Ã¥ÀÓÀÚ¿¡°Ô Á÷Á¢ Á¦Ãâ (e-mail: sangsul@postech.ac.kr) (À̸ÞÀϷθ¸ Á¦Ãâ)
             - °ø°í±âÇÑ: 2017³â 12¿ù 15ÀϱîÁö (ä¿ë ¿Ï·á½Ã °ø°í ¸¶°¨ÇÔ)
             - ¹®ÀÇó: ¿¬±¸Ã¥ÀÓÀÚ ÀÌ»ó¼³ ¹Ú»ç (054-279-1569)
 
 
Postdoctoral Research Associate - Pohang Accelerator Laboratory, POSTECH
Job Location: Pohang, South Korea, Facility: Pohang Light Source-II
Post details: Full time / Max. 3 year Fixed Term Contract
Application deadline: November, 30, 2017
Your tasks
–Research of EUV lithography using synchrotron radiation beamline facilities at Pohang Accelerator Laboratory(PAL) of POSTECH.
–Development of EUV imaging techniques as a research scientist. To apply these techniques for the development of novel instrumentation for novel experiments at synchrotrons.
-Manage industrial project (EUV Lithography) from ‚Samsung Science & Technology Foundation‘
Related project
1. Patterning technology for EUV new resist and related imaging chemistry (PI: Dr. Sangsul Lee)
Your profile
You have a PhD degree and experience in science and engineering. Programming skills are benefit to develop novel instrumental system for high resolution imaging. A background in experiments using synchrotron radiation would be advantageous. You should enjoy working in an interdisciplinary, multifunctional research environment. Being an passionate researcher and a good team player will help to ensure your success in completing your post-doctoral position in the Korean synchrotron radiation PAL.
We offer
Our institution is based on an interdisciplinary, innovative and dynamic collaboration. You will profit from a systematic training on the job based on cutting edge science in the research field.
Basic salary is 40,000 USD to 50,000 USD per year, and negotiation available according to your task and profile.
For further information please contact principle investigator (Dr. Sangsul Lee), phone +82-54-279-1569, e-mail sangsul@postech.ac.kr
Please directly submit your application to principle investigator‘s e-mail (including list of publications and addresses of referees) for the position as a Postdoctoral Fellow researcher.
Attached File Áö¿ø¼­¾ç½Ä.hwp
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